Tetramethylammonium hydroxide solution

Product Name:
Chemical formula: C4H13NO CAS No.: 75-59-2 EINECS No.: 200-882-9 UN No.: 1835 Purity grade: EL Place of origin: Foshan, China Appearance: Colorless transparent liquid, alcohol-like odor Melting Point: 63℃ Boiling point: 110℃ Density: 1.02 g/cm³


(1) Be used as anisotropic etching of silicon. 

(2) Be used as a basic solvent in the development of acidic photo resist in the photolithography process,

(3) Be highly effective in stripping photo resist

(4) Be used as a surfactant in the synthesis of ferrofluid, to inhibit nanoparticle aggregation.